In 1989 PSL designed and built a plasma source ion implantation (PSII) chamber based
on the technology developed by John Conrad, UW-Madison professor of nuclear
engineering and engineering physics. The PSII chamber is used to greatly extend
the life span of a wide variety of products, from ball bearings and machine
parts to artificial joints. All forms of ion implantation increase the durability
of materials by creating a hard surface layer. However, in PSII the
material is immersed in plasma rather than being subjected to a bombardment
of ions. Because the material is immersed, ions are uniformly integrated
with the surface layer, creating a single, hard protective layer rather
than a non-uniform coating.
Visit the PSII website. |